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Vapor Deposition of Lithium Tantalate with Volatile Double Alkoxide Precursors

Published online by Cambridge University Press:  15 February 2011

Kueir-Weei Chour ,
Guangde Wang  and
Ren Xu
Kueir-Weei Chour
Affiliation:
University of Utah, Department of Materials Science and Engineering, Salt Lake City, Utah 84112
Guangde Wang
Affiliation:
University of Utah, Department of Materials Science and Engineering, Salt Lake City, Utah 84112
Ren Xu
Affiliation:
University of Utah, Department of Materials Science and Engineering, Salt Lake City, Utah 84112
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Abstract

Stoichiometric vapor deposition of LiTaO3 is demonstrated by thermal evaporation of volatile LiTa(OButn)6, controlled vapor phase partial-hydrolysis, and subsequent polycondensation reactions on a heated substrate surface. Fully dense, amorphous LiTaO3 film of up to 34 μm thick can be obtained at high deposition rate of 23 μm per hour. Single phase LiTaO3 films are obtained by annealing as deposited films. The vapor phase species responsible for the stoichiometric vapor deposition appeared to be Li2Ta2(OButn)12 from variable temperature mass spectrometry results.

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References

[1] Bradley, D. C., Mehrotra, R. C., and Gaur, D. P., Metal Alkoxides, (Academic Press, London, 1978), pp. 299–334.Google Scholar