Hostname: page-component-54dcc4c588-br6xx Total loading time: 0 Render date: 2025-10-10T13:47:29.245Z Has data issue: false hasContentIssue false
  • English
  • Français

Synthesis of B-C-N Thin Films by Ion-Beam-Assisted Depositionand Their Mechanical Properties

Published online by Cambridge University Press:  17 March 2011

Akihito Matsumuro ,
Yoshimasa Kato  and
Hidenobu Ohta
Akihito Matsumuro
Affiliation:
Department of Micro system Engineering, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan
Yoshimasa Kato
Affiliation:
Department of Micro system Engineering, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan
Hidenobu Ohta
Affiliation:
Department of Micro system Engineering, Nagoya University, Chikusa-ku, Nagoya 464-8603, Japan
Get access

Abstract

B-C-N films have been synthesized by an ion-beam-assisted depositiontechnique, in which boron and carbon were evaporated by electron beam and amixed nitrogen and argon ion beam was simulataneously irradiated ontosilicon (100) substrates. The ratio of argon ions to nitrogen ions wasvaried by the flow rate ratio of Ar and N2 gases fed into the ion source. Inthis experiment, the influence of the ratio on the mechanical properties andthe microstructure were investigated. Nano indentation studies show themaximum hardness up to 23 GPa at the gas ratio of 25.50 %. The filmsprepared under the appropriate conditions indicated low frictioncoefficients of 0.04-0.08 against a sapphire ball and excellent wearresistance. The existence of a cubic B-C-N like phase in the film, which hasbeen predicted as one of new hard materials, was revealed by variousmicro-structural analyses. It was concluded that the excellent mechanicalproperties prepared at the optimum gas ratio could be attributed to theappearnce of the new cubic like phase.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 647: Symposium O – Ion Beam Synthesis & Processing of Advanced Materials , 2000 , O11.5
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

1. Popov, C., Saito, K., Yamamoto, A., Ouchi, A., Nakamura, T., Ohana, Y. and Koga, Y., J. Mater. Sci. 53,1281(1998).Google Scholar
2. Ren, Z., Du, Y., Ying, Z., Li, F., Lin, J., Ren, Y. and Zong, X, Mater. Chem. Phys. 50,98(1997).Google Scholar
3. Watanabe, M. O., Itoh, S. and Mizushima, K., Appl. Phys. Lett. 68,2962(1996).Google Scholar
4. Derre, A., Filipozzi, L., Bouyer, F. and Marchand, A., J. Mater. Sci. 29, 1589(1994).Google Scholar
5. Kohazaki, M., Matsumuro, A., Hayashi, T., Muramatsu, M. and Yamaguchi, K., Thin Solid Films 308–309, 239(1997).Google Scholar
6. Mirkarimi, P. B., McCarty, K. F., Medlin, D. L., Wolfer, W. G., Friedmann, T. A., Klaus, E. J., Cardinale, G. F. and Howitt, D. G., J. Mater. Res., 9, 2925(1994).Google Scholar
7. McChlune, W. F., Powder Diffraction File Release 1999, (International Center for Diffraction Data, Pennsylvania, 1999).Google Scholar
8. Polo, M. C., Martinez, E., Esteve, J. and Andjar, J. L., Diamond and Related Materials 8,423(1999).Google Scholar
9. Hayashi, T., Matsumuro, A., Muramatsu, M., Kohzaki, M. and Yamaguchi, K., Thin Solid Films (2000), in press.Google Scholar