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Stress-field in Sputtered Mo Thin Films and Mo/Ni Superlattices: Origin and Evolution after Ion-Irradiation

Published online by Cambridge University Press:  01 February 2011

A. Debelle ,
G. Abadias ,
A. Michel ,
C. Jaouen ,
Ph. Guérin  and
M. Drouet
A. Debelle
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
G. Abadias
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
A. Michel
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
C. Jaouen
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
Ph. Guérin
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
M. Drouet
Affiliation:
Laboratoire de Métallurgie Physique, UMR 6630, Université de Poitiers, SP2MI, Téléport 2, 86962 Chasseneuil-Futuroscope, FRANCE
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Abstract

In the present study the ion irradiation technique is used to investigate the origin of the stress-field in Mo layers grown by ion beam sputtering. Strain measurements were performed by X- ray Diffraction (XRD) using the sin 2 ψ method. The evolution of the sin 2 ψ plots with ion irradiation shows that the usual assumption of a biaxial stress state is not adequate to determine the true stress-free lattice parameter a 0 of the film. A new stress model based on a triaxial state of stress, which includes a hydrostatic component linked to point defects induced volume distortions, is derived to interpret the XRD results. For pure Mo films, the obtained a 0 parameter is close to the bulk value, while for Mo sublayers in Mo/Ni superlattices, the a 0 value is lower due to intermixing between Ni and Mo. These results demonstrate that ion irradiation is a powerful tool for stress relaxation, which allows to obtain additional information on the respective contribution of chemical effects and growth defects to the a 0 value.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 795: Symposium U – Thin Films - Stresses and Mechanical Properties X , 2003 , U12.3
Copyright
Copyright © Materials Research Society 2004

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References

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