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Properties of Titanium Oxide Thin Film Prepared with E-beam Evaporation

Published online by Cambridge University Press:  11 February 2011

Ping Hou  and
Lianchao Sun
Ping Hou
Affiliation:
Nortel Networks Inc.
Lianchao Sun
Affiliation:
SOPRA Inc.
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Abstract

The optical and mechanical properties of TiO2 film prepared by ion-assisted e-beam evaporation have been examined in this research. Spectroscopic ellipsometry analysis revealed an inhomogeneous behavior in both optical property and growth structure, vertically from substrate to the top surface of the film. This phenomenon was further confirmed with the electron microscopic analyses. The effects of deposition rate, chamber pressure, anode voltage and current on the stress of TiO2 films were also investigated and reported. Further study showed that a structural homogeneous film could be obtained through TiO2-SiO2 co-evaporation.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 749: Symposium W – Morphological and Compositional Evolution of Thin Films , 2002 , W5.10
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCE

1 Bennett, Jean M et al, “Comparison of the properties of titanium dioxide films prepared by various techniques,” Appl. Opt. 28, 3303–3317 (1989)Google Scholar
2 Chiao, Shu-Chung, Bovard, Bertrand G., and Macleod, H. A., “Repeatability of the composition of titanium oxide films produced by evaporation of Ti2O3 ,” Appl. Opt. 37, 5284–5290 (1998).Google Scholar
3 Zabeida, O., Klemberg-Sapieha, J. E., Martinu, L., and Morton, D. E., “Ion Bombardment Characteristics During the Growth of Optical Films Using a Cold Cathode Ion Source,” 42nd Annual Technical Conference Proceeding of the SVC, 267 (1999).Google Scholar
4 McNeil, John R., Barron, Alan C., Wilson, S. R., and Herrmann, W. C. Jr, “Ion-assisted deposition of optical thin film: Low energy vs high energy bombardment,” Appl. Opt. 23, 552–559 (1984).Google Scholar
5 Chao, Shiuh, Wang, Wen-Hsiang, and Lee, Cheng-Chung, “Low-loss dielectric mirror with ion-beam-sputtered TiO2-SiO2 mixed films,” Appl. Opt. 40, 2177–2182 (2001).Google Scholar