Hostname: page-component-54dcc4c588-xh45t Total loading time: 0 Render date: 2025-10-11T18:57:28.407Z Has data issue: false hasContentIssue false
  • English
  • Français

Precise and Smooth Removal from Polymer Surfaces by VUV Excimer Laser Ablation at 157 nm: PMMA.

Published online by Cambridge University Press:  10 February 2011

G. Padeletti ,
M. Lapczyna  and
M. Stuke
G. Padeletti
Affiliation:
Max-Planck-Institut fir biophysikalische Chemie, P.O Box 2841, D-37018 Gottingen, Germany, mstuke@gwdg.de.
M. Lapczyna
Affiliation:
Istituto di Chimica dei Materiali-Consiglio Nazionale delle Ricerche, cp 10 Monterotondo Staz., 00016 Monterotondo (Roma), Italy, pad@mlib.cnr.it
M. Stuke
Affiliation:
Istituto di Chimica dei Materiali-Consiglio Nazionale delle Ricerche, cp 10 Monterotondo Staz., 00016 Monterotondo (Roma), Italy, pad@mlib.cnr.it
Get access

Abstract

Smooth polymer surfaces can be generated by VUV laser ablation at 157 nm. This has been demonstrated for poly-methyl-metacrylate (PMMA) by atomic force microscopy (AFM) analysis of laser-exposed surfaces. At excimer laser fluences below 30 mJ/cm2 the mean roughness (Ra) remains below 10 nm for both single and 10 shot exposures.

A detailed characterization of the surface nano-morphology distribution carried out by the “power spectral density” (PSD) analysis, shows that the surface is smoothened by the VUV laser for lateral scales smaller than 20 μm.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 544: Symposium Y – Plasma Deposition and Treatment of Polymers , 1998 , 3
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

1. Lapczyna, M., Stuke, M., Appl.Phys. A66, 473, (1998)Google Scholar
2. Lapczyna, M., Ph.D. Thesis (1998), University of Kassel, Germany Google Scholar
3. Lapczyna, M., Stuke, M., Applied Physics A, (1999)Google Scholar
4. Binning, G., Quate, C. F. and Gerber, C., Phys. Rev. Lett., 56, 930, (1997)Google Scholar
5. Padeletti, G., Larciprete, R., J. Vac. Sci. Techn. B16, 1762, (1998).Google Scholar
6. Bhushan, B., in Tribology and Mechanism of Magnetic Storage Devices (Springer, NewYork,1998)Google Scholar
7. Russ, J. C., in Computer Assisted Microscopy the Measurements and Analysis of Images (Plenum, New York, 1993)Google Scholar