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Post Deposition Ultraviolet Treatment of Silicon Nitride Dielectric: Modeling and Experiment

Published online by Cambridge University Press:  01 February 2011

Vladimir Zubkov ,
Mihaela Balseanu ,
Li-Qun Xia  and
Hichem M'Saad
Vladimir Zubkov
Affiliation:
Vladimir_Zubkov@amat.com, Applied Materials Inc., Thin Films Group, 3050 Bower Ave., P.O.BOX 58309, Santa Clara, CA, 95054, United States
Mihaela Balseanu
Affiliation:
Mihaela_Balseanu@amat.com, Applied Materials Inc., Thin Films Group, 3050 Bowers Ave.,, Santa Clara, CA, 95054, United States
Li-Qun Xia
Affiliation:
Li-Qun_Xia@amat.com, Applied Materials Inc., Thin Films Group, 3050 Bowers Ave.,, Santa Clara, CA, 95054, United States
Hichem M'Saad
Affiliation:
Hichem_M'saad@amat.com, Applied Materials Inc., Thin Films Group, 3050 Bowers Ave.,, Santa Clara, CA, 95054, United States
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Abstract

Simulation and FTIR analysis of the UV treatment impact on bond strengths of PECVD deposited silicon nitride films

Keywords

dielectricsimulationinfrared (IR) spectroscopy

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References

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