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Phase Formation and Phase Stability in the Al-Ti Thin Film System

Published online by Cambridge University Press:  26 February 2011

L.R. Parks ,
D.A. Lilienfeld ,
P. BØRgesen  and
R. Raj
L.R. Parks
Affiliation:
Cornell University, Dept of Materials Science and Engineering, Ithaca, NY
D.A. Lilienfeld
Affiliation:
Cornell University, National Nanofabrication Facility, Ithaca, NY, 14853
P. BØRgesen
Affiliation:
Cornell University, Dept of Materials Science and Engineering, Ithaca, NY
R. Raj
Affiliation:
Cornell University, Dept of Materials Science and Engineering, Ithaca, NY
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Abstract

This study focuses on the sequential formation of aluminide phases during annealing of titanium and aluminum thin film bilayers. The formation of titanium-rich intermetallic phases at higher annealing temperatures is emphasized. Using Rutherford Backscattering Spectrometry (RBS) analysis, and x-ray diffraction, phases formed as a function of temperature have been identified. The phases Al3Ti through Ti3Al were observed over the temperature range 450–750°C, where reaction with the SiO2 substrate occurred. All phases were present as discreet layers within the samples with several layered phases coexisting at the higher temperatures.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 213: Symposium Q – High-Temperature Ordered Intermetallic Alloys IV , 1990 , 925
Copyright
Copyright © Materials Research Society 1991

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References

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