Hostname: page-component-54dcc4c588-64p75 Total loading time: 0 Render date: 2025-10-10T14:43:55.021Z Has data issue: false hasContentIssue false
  • English
  • Français

Perpendicular Magnetic Anisotropy in Ultrathin Fe (110) Films on Cr (110)

Published online by Cambridge University Press:  03 September 2012

Helmut Fritzscht  and
Ulrich Gradmann
Helmut Fritzscht
Affiliation:
Physikalisches Institut, Technische Universität Clausthal, D 3392 Clausthal-Zellerfeld, Germany.
Ulrich Gradmann
Affiliation:
Physikalisches Institut, Technische Universität Clausthal, D 3392 Clausthal-Zellerfeld, Germany.
Get access

Abstract

In contrast to Fe(110) -films on W(110), which are magnetized always in the plane as a result of easy-plane magnetic surface anisotropies (MSA), Fe(110) -films on Cr(110) show perpendicular magnetization up to a thickness of roughly 3 Monolayers, as a result of a perpendicular MSA of the Fe(110)/Cr/(110) interface. Acoordingly, Fe(110) -films on W(110), covered with Cr(110), show asymmetric MSA, the easy-plane mSA of the W(110)/Fe(110) -interface opposing the perpendicular one of the Fe(110)/Cr(110) -interface. It turns out that MSA is asymmetric too in Fe(110) films on W(110) covered by Cu, Ag, Au or UHV.

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

1. Jonker, B.T., Walker, K.H., Kisker, E., Prinz, G.A. and Carbone, C., Phys. Rev. Lett. 57, 142 (1986).Google Scholar
2. Koon, N.C., Jonker, B.T., Volkening, F.A., Krebs, J.J. and Prinz, G.A., Phys. Lett. 59, 2463 (1987).Google Scholar
3. Stampanoni, M., Vaterlaus, A., Aeschlimann, M. and Meier, F., Phys. Rev. Lett. 59, 2483 (1987).Google Scholar
4. Heinrich, B., Urquhart, K.B., Dutcher, R.R., Purcell, S.T., Cochran, J.F. and Arrott, A.S., J. Appl. Phys. 63, 3863 (1988).Google Scholar
5. Dutcher, J.R., Cochran, J.F., Heinrich, B. and Arrott, A.S., J. Appl. Phys. 64, 6095 (1988)Google Scholar
6. Elmers, H.J. and Gradmann, U., Appl. Phys. A 51, 255 (1990);Google Scholar
Elmers, H.J., Furubayashi, T., Albrecht, M. and Gradmann, U., J. Appl. Phys. 70, 5764 (1991).Google Scholar
7. Grünberg, P., Schreiber, R., Pang, Y., Brodsky, M.B. and Sowers, H., Phys. Rev. Lett. 11, 2442 (1986).Google Scholar
8. Grünberg, P., Barnás, J., Saurenbach, F., Fuβ, J. A., Wolf, A. and Vohl, M., J. Magn. Magn. Mat. 93, 58 (1991).Google Scholar
9. Parkin, S.S.P., More, N. and Roche, K.P., Phys. Rev. Lett. 64, 2304 (1990).Google Scholar
10. Baibich, M.N., Broto, J.M., Fert, A., Nguyen Van Dau, F., Petroff, F., Etienne, , Creuzet, G., Friederich, A. and Chazelas, J., Phys. Rev. Lett. 61, 2472 (1988).Google Scholar
11. Unguris, J., Celotta, R.J. and Pierce, D.T., Phys. Rev. Lett. 67, 140 (1991).Google Scholar
12. Gradmann, U., J. Magn. Magn. Mat. 54, 313 (1986).Google Scholar
13. Bruno, P. and Renard, J.P., Appl. Phys. A 49, 499 (1989).Google Scholar
14. Carcia, P.F., J. Appl. Phys. 63, 5066 (1988).Google Scholar
15. den Broeder, F.J.A., Hoving, W. and Bloemen, P.J.H., J. Magn. Magn. Mat. 93, 562 (1991).Google Scholar
16. Gradmann, U., Magnetism in Transition Metal Films, in Buschow, K.H.J. (ed), Ferromagnetic Materials, Volume 7, Elsevier 1993.Google Scholar
17. Albrecht, M., Furubayashi, T., Przybylski, M., Korecki, J. and Gradmann, U., J. Magn. Magn. Mat. 113, 207 (1992).Google Scholar
18. Fritzsche, H., Albrecht, M. and Gradmann, U., to be published.Google Scholar
19. Gradmann, U., Ann. Physik (Leipzig) 17, 91 (1966).Google Scholar
20. Bergholz, R. and Gradmann, U., J. Magn. Magn. Mat. 45, 389 (1984).Google Scholar
21. Lugert, G. and Bayreuther, G., Thin Solid Films 175, 311 (1989).Google Scholar
22. Fritzsche, H. and Gradmann, U., to be published.Google Scholar
23. Clemens, B.M., Osgood, R., Payne, A.P., Lairson, B.M., Brennan, S., White, R.L. and Nix, W.D., preprint 1992.Google Scholar
24. Gradmann, U., Przybylski, M., Elmers, H.J. and Liu, G., Appl. Phys. A 49, 563 (1989).Google Scholar