Hostname: page-component-54dcc4c588-br6xx Total loading time: 0 Render date: 2025-10-09T07:09:42.673Z Has data issue: false hasContentIssue false
  • English
  • Français

Performance of Ultrahigh Resolution Electron Microscope JEM-4000EX and some Applications of High Tc Superconductor

Published online by Cambridge University Press:  21 February 2011

Toshikazu Honda ,
Katsuhiko Ibe ,
Yukihisa Ishida  and
Michael M. Kersker
Toshikazu Honda
Affiliation:
JEOL LTD., 1-2 Musashino 3-chome, Akishima, Tokyo 196, Japan
Katsuhiko Ibe
Affiliation:
JEOL LTD., 1-2 Musashino 3-chome, Akishima, Tokyo 196, Japan
Yukihisa Ishida
Affiliation:
JEOL LTD., 1-2 Musashino 3-chome, Akishima, Tokyo 196, Japan
Michael M. Kersker
Affiliation:
JEOL (U.S.A.) Inc., 11 Dearborn Road, Peabody, MA 01960, U.S.A.
Get access

Abstract

The high resolution electron microscope is powerful for modern materials science, because of its direct observation capability for the atomic structure of materials. The JEM-4000EX, a 400 kV accelerating voltage electron microscope whose objective lens has a 1 mm spherical aberration coefficient, has a 0.168 nm theoretical resolving power. Using this microscope, atomic structure images of high Tc superconductor such as Y-Ba-Cu-O, Bi-Ca-Sr-Cu-O and Tl -Ca-Ba-Cu-O were observed.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 139: Symposium R – High Resolution Microscopy of Materials , 1989 , 241
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

[1] Uyeda, N., Kobayashi, T., Ishizuka, Y., Fujiyoshi, Y. and Kobayashi, K., Proc. 6th Europe Congr. E. M. 1 79 (1976)Google Scholar
[2] Horiuchi, S. and Matsui, Y., Phil. Mag. 30 777 (1974)Google Scholar
[3] Hanssen, K. J. and Trepte, L., Optik 32 519 (1971)Google Scholar
[4] Frank, J., Optik 38 519 (1973)Google Scholar
[5] Honda, T., Ibe, K., Suzuki, S., Ishida, Y. and Tsuno, K., Proc. EMAG 85 579 (1985)Google Scholar
[6] Bourret, A. and Penisson, J. M., JEOL News 24E 2 (1987)Google Scholar
[7] Hiraga, K., Hirabayashi, M., Kikuchi, M. and Shono, Y., Jpn. J. Appl. Phys. 27 L573 (1988)CrossRefGoogle Scholar
[8] Shindo, D., Hiraga, K., Hirabayashi, M., Kikuch, M. and Syono, Y., Jpn. J. Appl. Phys. 27 L1018 (1988)Google Scholar
[9] Matsui, Y., Maeda, H.,-Tanaka, y., Takayama-Muromachi, E., Takekawa, S. and Horiuchi., S. Jpn. J. Appl. Phys. 27 L827 (1988)Google Scholar