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A New Transfer Technique for Graphene Deposited by CVD on Metal Thin Films

Published online by Cambridge University Press:  22 May 2014

G. Amato ,
E. Simonetto ,
L. Croin  and
E. Vittone
G. Amato
Affiliation:
The Quantum Research Laboratory, INRIM, strada delle Cacce 91, I-10135, Torino, Italy
E. Simonetto
Affiliation:
The Quantum Research Laboratory, INRIM, strada delle Cacce 91, I-10135, Torino, Italy Dept. of Applied Science and Technology, Polytechnic of Turin, Corso Duca degli Abruzzi 24, I-10129, Torino, Italy
L. Croin
Affiliation:
The Quantum Research Laboratory, INRIM, strada delle Cacce 91, I-10135, Torino, Italy Dept. of Applied Science and Technology, Polytechnic of Turin, Corso Duca degli Abruzzi 24, I-10129, Torino, Italy
E. Vittone
Affiliation:
Physics Dept. and NIS center, University of Turin, Via Pietro Giuria 1, I-10125, Torino, Italy.
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Abstract

Chemical Vapor Deposition of graphene on metallic substrates is one of the most attracting techniques for large area graphene production. The technique widely employed for transferring graphene to other substrates involves deposition of a polymer support with subsequent etching of the metal substrate. Here we report a safer transfer process, which requires a two-step PMMA deposition and bonding under pressure. Sheets of graphene before and after transfer have been both characterized by Raman spectroscopy, and show comparable quality, indicating that the proposed technique does not introduce additional defects in graphene.

Keywords

thin filmchemical vapor deposition (CVD) (deposition)Raman spectroscopy

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