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Modification of Optical Properties in Transition Metal Ion Implanted Silica

Published online by Cambridge University Press:  21 February 2011

G. Whichard ,
H. C. Mogul ,
R. A. Weeks ,
J. D. Stark  and
R. Zuhr
G. Whichard
Affiliation:
Vanderbilt University, Nashville, TN 37235
H. C. Mogul
Affiliation:
Vanderbilt University, Nashville, TN 37235
R. A. Weeks
Affiliation:
Vanderbilt University, Nashville, TN 37235
J. D. Stark
Affiliation:
Vanderbilt University, Nashville, TN 37235
R. Zuhr
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, TN 37831
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Abstract

Ellipsometric and ion backscattering techniques were used to investigate the changes in refractive index and thicknest of a surface layer of high purity silica modified by transition metal ion implantation. Samples were implanted with Cr+, Mn+, and Fe+ ions to doses ranging from 0.5 × 1016 to 6.0 × 1016 ions/cm2. The refractive index of the ion implanted region increased with increasing implantation dose. A single layer model for the implanted region was determined to be consistent with the ion backscattering profiles and ellipsometric data.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 126: Symposium P – Advanced Surface Processes for Optoelectronics , 1988 , 105
Copyright
Copyright © Materials Research Society 1988

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References

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