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Microstructural Characterization of Al2O3 Following Simultaneous Triple Ion Bombardment

Published online by Cambridge University Press:  25 February 2011

S. J. Zinkle
S. J. Zinkle*
Affiliation:
Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, TN 37831-6376, USA
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Abstract

The through-range microstructure of polycrystalline alumina has been examined by cross-section TEM following simultaneous implantation of 2.0 MeV Al+, 1.44 MeV O+, and 0.2 to 0.4 MeV He+ ions at room temperature to a dose of 3.1 keV/atom. The specimen remained crystalline following the irradiation, and four distinct radiation-induced defect features were observed: Network dislocations, dislocation loops, small cavities, and oblong clusters that may be aluminum colloids. The microstructure near the implanted ion region was qualitatively similar to that observed in irradiated regions far from the implanted zone.

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References

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