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Mechanistic Aspects of the Deposition of thin Alumina Films Deposited by Mocvd

Published online by Cambridge University Press:  21 February 2011

R. W. J. Morssinkhof ,
T. Fransen ,
M. M. D. Heusinkveld  and
P. J. Gellings
R. W. J. Morssinkhof
Affiliation:
Laboratory of Inorganic Chemistry, Materials Science and Catalysis, University of Twente, P.O. Box 217, 7500 AE Enschede, the Netherlands
T. Fransen
Affiliation:
Laboratory of Inorganic Chemistry, Materials Science and Catalysis, University of Twente, P.O. Box 217, 7500 AE Enschede, the Netherlands
M. M. D. Heusinkveld
Affiliation:
Laboratory of Inorganic Chemistry, Materials Science and Catalysis, University of Twente, P.O. Box 217, 7500 AE Enschede, the Netherlands
P. J. Gellings
Affiliation:
Laboratory of Inorganic Chemistry, Materials Science and Catalysis, University of Twente, P.O. Box 217, 7500 AE Enschede, the Netherlands
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Abstract

The object of this study is the decomposition mechanism of Aluminium-Tri- Isopropoxide and its influence on the deposition of A12O3 by MOCVD. DSC experiments reveal that the decomposition occurs in two steps: formation of aluminum hydroxide, followed by dehydration.

Deposition of A12O3 takes place by diffusion of AI(OH)3 to the substrate surface, followed by dehydration to Al2O3. This is supported by the insignificant amount of carbon found in the coating analyzed by XPS. A Langmuir type adsorption of the reactive components explains the change in reaction order of ATI from one at atmospheric pressure to two at 3 torr.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 125
Copyright
Copyright © Materials Research Society 1990

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