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Magnetron Dry Etching for Photonic Device Fabrication

Published online by Cambridge University Press:  22 February 2011

H. E. G. Arnot ,
H. P. Zappe ,
J. E. Epler ,
B. Graf ,
R. Widmer  and
H. W. Lehmann
H. E. G. Arnot
Affiliation:
Paul Scherrer Institute Zürich, Badenerstrasse 569, CH-8048 Zürich, Switzerland
H. P. Zappe
Affiliation:
Paul Scherrer Institute Zürich, Badenerstrasse 569, CH-8048 Zürich, Switzerland
J. E. Epler
Affiliation:
Paul Scherrer Institute Zürich, Badenerstrasse 569, CH-8048 Zürich, Switzerland
B. Graf
Affiliation:
Paul Scherrer Institute Zürich, Badenerstrasse 569, CH-8048 Zürich, Switzerland
R. Widmer
Affiliation:
Paul Scherrer Institute Zürich, Badenerstrasse 569, CH-8048 Zürich, Switzerland
H. W. Lehmann
Affiliation:
Paul Scherrer Institute Zürich, Badenerstrasse 569, CH-8048 Zürich, Switzerland
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Abstract

Magnetron dry etching using SiCl4, combined with a smooth reflowed photoresist masking technique has been used to fabricate GaAs/AlGaAs ridge waveguides. The effect of pressure, flowrate and power on etch rate and sidewall smoothness has been studied. Waveguides fabricated using optimum parameters exhibited optical losses lower than those achievable using wet etching. This process was further used in the fabrication of Fabry Perot ridge lasers, detectors and phase modulators.

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References

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