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Laser Ablation Deposition (LAD) of Metallic Thin Films

Published online by Cambridge University Press:  03 September 2012

J. P. Rebouiliat ,
B. Michelutti ,
Y. Souche ,
J. P. Gavigan ,
D. Givord  and
A. Lienard
J. P. Rebouiliat
Affiliation:
Laboratoire Louis Néel, C.N.R.S., 166 X, 38042 GRENOBLE cedex, France
B. Michelutti
Affiliation:
Laboratoire Louis Néel, C.N.R.S., 166 X, 38042 GRENOBLE cedex, France
Y. Souche
Affiliation:
Laboratoire Louis Néel, C.N.R.S., 166 X, 38042 GRENOBLE cedex, France
J. P. Gavigan
Affiliation:
Post doctoral research fellow of the Commission of the European Communities DG XII ‐ EURAM
D. Givord
Affiliation:
Laboratoire Louis Néel, C.N.R.S., 166 X, 38042 GRENOBLE cedex, France
A. Lienard
Affiliation:
Laboratoire Louis Néel, C.N.R.S., 166 X, 38042 GRENOBLE cedex, France
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Abstract

Several experiments have been carried out to characterize the laser ablation deposition of metallic thin films as a function of the various process parameters. Ablation thresholds have been investigated for Al, Cu and Au targets as a function of wavelength as well as the fluence dependence of ablation rate. The effect of electric fields on the particle component of the ablated material has been investigated. Measurements of the velocity distribution of these particles have also been carried out for Al, Cu and Au targets as a function of the laser parameters with a view to using a velocity filter to remove the particles from the ablated beam.

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References

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