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Ion Beam Sputter Deposition of Refractory Metal Oxides

Published online by Cambridge University Press:  21 February 2011

B.E. Kempf ,
H.W. Dinges  and
A. PÖcker
B.E. Kempf
Affiliation:
Deutsche Bundespost Telekom Forschungs- und Technologiezentrum, D-64276 Darmstadt, Germany
H.W. Dinges
Affiliation:
Deutsche Bundespost Telekom Forschungs- und Technologiezentrum, D-64276 Darmstadt, Germany
A. PÖcker
Affiliation:
Deutsche Bundespost Telekom Forschungs- und Technologiezentrum, D-64276 Darmstadt, Germany
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Abstract

Oxides of hafnium, niobium, tantalum, and zirconium are deposited by ion beam sputtering of the pure metal targets using CO2 as working gas. The resulting thin films are amorphous, featureless smooth and of excellent adherence to semiconductor substrates. Despite a certain content of carbon they are highly transparent in the visible and near infrared wavelength range as determined by spectroscopic ellipsometry. Their wide range of refractive indices makes them suitable for multilayer optical filter design.

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