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Ion Beam Processing of Optical Materials

Published online by Cambridge University Press:  25 February 2011

F. L. Williams ,
L. L. Boyer ,
D W. Reicher ,
J. J. McNally ,
G. A. Al-Jumaily  and
J. R. McNeil
F. L. Williams
Affiliation:
University of New Mexico Department of Electrical and Computer Engineering Center for High Technology Materials Albuquerque, NM 87131
L. L. Boyer
Affiliation:
University of New Mexico Department of Electrical and Computer Engineering Center for High Technology Materials Albuquerque, NM 87131
D W. Reicher
Affiliation:
University of New Mexico Department of Electrical and Computer Engineering Center for High Technology Materials Albuquerque, NM 87131
J. J. McNally
Affiliation:
University of New Mexico Department of Electrical and Computer Engineering Center for High Technology Materials Albuquerque, NM 87131
G. A. Al-Jumaily
Affiliation:
University of New Mexico Department of Electrical and Computer Engineering Center for High Technology Materials Albuquerque, NM 87131
J. R. McNeil
Affiliation:
University of New Mexico Department of Electrical and Computer Engineering Center for High Technology Materials Albuquerque, NM 87131
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Abstract

We have deposited thin films of optical materials using ion beam sputtering and ion assisted deposition techniques. It is possible to obtain good quality film material deposited on substrates at temperatures lower than normally required. Ion assisted deposition influences film stoichiometry and packing density, which in turn determine optical and mechanical properties of the film material. We discuss two general indicators which appear helpful in predicting the degree to which these occur.

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References

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