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High Resolution Electron Microscopy Studies of Interfaces Between Al203 Substrates and MBE Grown NB Films

Published online by Cambridge University Press:  26 February 2011

J. Mayer ,
J. Dura ,
C.P. Flynn  and
M. RüHle
J. Mayer
Affiliation:
Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, 7000 Stuttgart, FRG
J. Dura
Affiliation:
University of Illinois at Urbana-Champaign, Materials Research Laboratory, Urbana, IL 61801, USA
C.P. Flynn
Affiliation:
University of Illinois at Urbana-Champaign, Materials Research Laboratory, Urbana, IL 61801, USA
M. RüHle
Affiliation:
Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, 7000 Stuttgart, FRG
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Abstract

Single crystal niobium films were grown by Molecular Beam Epitaxy (MBE) on (0001)s sapphire substrates. Cross-sectional specimens with thickness of <20 nm were prepared so that the Nb/A1203 interface could be investigated by high resolutionelectron microscopy (HREM). The orientation relationship between the metal film and the ceramic substrate was verified by selected area diffraction: (111)Nb ║(0001)S and [110]Nb║[2110]S. The atomistic structure of the interface was identified by HREM.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 209: Symposium K – Defects in Materials , 1990 , 673
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

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