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Fabrication of Diamond and Diamond-Like Carbon by Low Pressure Inductively Coupled Plasma CVD

Published online by Cambridge University Press:  15 February 2011

Katsuyuki Okada ,
Shojiro Komatsu ,
Takamasa Ishigaki  and
Seiichiro Matsumoto
Katsuyuki Okada
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
Shojiro Komatsu
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
Takamasa Ishigaki
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
Seiichiro Matsumoto
Affiliation:
National Institute for Research in Inorganic Materials, 1–1 Namiki, Tsukuba, Ibaraki 305, Japan
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Abstract

A 13.56 MHz inductively coupled plasma(ICP) system has been applied to fabricate diamond and diamond-like carbon from a CH4/H2/Ar plasma. The characterizations of the obtained deposits by transmission electron diffraction, reflection high energy electron diffraction, and Raman scattering revealed that the deposits are diamond crystallites, with crystal sizes ∼1μm, and that they partially include disordered microcrystalline graphite. Although contamination due to etching of the quartz tube exists, this was drastically suppressed by the electrostatic shield(Faraday shield).

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 157
Copyright
Copyright © Materials Research Society 1995

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