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Evaluation of Multilayers for Soft X-Ray Fabricated by Ion Beam Sputtering.

Published online by Cambridge University Press:  25 February 2011

I. Kataoka ,
I. Yamada ,
K. Eto  and
K. Ito
I. Kataoka
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
I. Yamada
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
K. Eto
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
K. Ito
Affiliation:
Japan Aviation Electronics Industry, Limited, Akishima Plant, 1-1 Musashino 3-chome, Akishima-shi, Tokyo 196 Japan
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Abstract

Multilayer structures of Li20 and Ni were deposited onto polished fused quartz by the dual ion beam sputtering method. Optical and physical properties of the multilayer structure were evaluated. Reflectivity of multilayer mirrors at an incident angle of 79.6 deg. was 17% for 44Å(C-K line). There was good agreement with the calculated value considering the interface roughness and residual oxygen contamination in the Ni layer from the background of Li2O deposition.

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References

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