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Enhancement of Porosity and Surface Roughness of Cured PhenolicResin by Ion Implantation

Published online by Cambridge University Press:  17 March 2011

R.L. Zimmerman ,
D. Ila ,
C.C. Smith ,
A.L. Evelyn ,
D.B. Poker  and
D.K. Hensley
R.L. Zimmerman
Affiliation:
Center For Irradiation of Materials, Alabama A&M University, Normal, AL 35762
D. Ila
Affiliation:
Center For Irradiation of Materials, Alabama A&M University, Normal, AL 35762
C.C. Smith
Affiliation:
Center For Irradiation of Materials, Alabama A&M University, Normal, AL 35762
A.L. Evelyn
Affiliation:
Center For Irradiation of Materials, Alabama A&M University, Normal, AL 35762
D.B. Poker
Affiliation:
Oak Ridge National Laboratory, SMAC, Oak Ridge, TN, 37831
D.K. Hensley
Affiliation:
Oak Ridge National Laboratory, SMAC, Oak Ridge, TN, 37831
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Abstract

We present recent results using ions such as C., O, Si, Fe, Zn, and Au atenergies between 100 keV to 10 MeV to increase the roughness and porosity ofthe partially and fully cured precursor phenolic resins. The fully curedphenolic resin is called Glassy Polymeric Carbon (GPC). GPC is chemicallyinert, biocompatible and useful for medical applications, such as heartvalves and other prosthetic devices. Ion implantation enhances biologicalcell/tissue growth on, and tissue adhesion to, prosthetic devices made fromGPC. We have previously shown that increased porosity of GPC is also usefulfor drug delivery devices. The porosity of the ion implanted partially andfully cured precursor phenolic resins was measured by introducing lithiumfrom a molten LiCl salt into each sample. By using Li(p,2α) nuclear reactionanalysis (NRA) we measured the concentration of Li retention in the pre- andpost-implanted samples. The surface roughness was measured using opticalmicroscopy. The curing process was monitored using micro-Raman microscopy.We have correlated the NRA measurements of increased pore availability withthe observations of increased surface roughness.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 647: Symposium O – Ion Beam Synthesis & Processing of Advanced Materials , 2000 , O4.8
Copyright
Copyright © Materials Research Society 2001

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