Published online by Cambridge University Press: 25 February 2011
Since the first time-resolved Raman studies of pulsed laser annealing (PLA)effects in Si, a number of cw Raman studies have been performed whichprovide a much improved basis for understanding the consequences on Ramanspectra of temperature-dependent resonance effects, high carrier densityeffects, phonon anharmonicity, and strain effects. Here we briefly reviewthese effects and then analyze the latest pulsed Raman studies of PLAincluding Stokes/anti-Stokes ratios, the shift and shape of the first orderline, and time-resolved second-order spectra. The Raman data indicate theexistence of a Raman-silent phase followed by a rapidly cooling solid whichbegins within 300 K of the normal melting temperature of Si. The Raman dataalso give evidence of carrier densities in the recrystallizing solid of ~1−2×l019/cm3 .