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Effects of Arriving Atom Kinetic Energy on the Structure and Magnetic Properties of Thin Sputter-Deposited Films

Published online by Cambridge University Press:  10 February 2011

R. J. Wilson ,
T. J. Minvielle ,
M. L. Hildner  and
R. L. White
R. J. Wilson
Affiliation:
IBM Almadén Research Center, San Jose, CA 95120.
T. J. Minvielle
Affiliation:
Dept. Mater. Sci., Stanford University, Stanford, CA 94305
M. L. Hildner
Affiliation:
IBM Almadén Research Center, San Jose, CA 95120.
R. L. White
Affiliation:
Dept. Mater. Sci., Stanford University, Stanford, CA 94305
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Abstract

Thin multilayer films are of growing importance as magnetic sensors. One key parameter in their performance is the interlayer magnetic coupling field which can vary in both sign and strength. Experiments performed to explore the effects of sputter deposition methods on the coupling fields observed for Co/Cu multilayers and spin valves on single crystal substrates are described. Scanning Tunneling Microscopy is used to qualitatively understand the large differences in observed coupling fields.

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References

REFERENCES

1. Baibich, M. N., Broto, J. M., Fert, A., Nguyen Van Dau, F., Petroff, F., Etienne, P., Creuzet, G., Friederich, A. and Chazclas, J., Phys. Rev. Lett. 61, 2472 (1988).Google Scholar
2. Dieny, B., Speriosu, V. S., Parkin, S. S. P., Gurney, B. A., Wilhoit, D. A. and Mauri, D., Phys. Rev. B 43, 1297 (1991).Google Scholar
3. Chiang, S., Wilson, R. J., Gerber, Ch. and Hallmark, V. M., J. Vac. Sci. Technol. A 6, 386 (1988).Google Scholar
4. Stuart, R. V., Wehneer, G. K. and Anderson, G. S., J. Appl. Phys. 40, 803 (1969).Google Scholar
5. Minvielle, T. J., White, R. L. and Wilson, R. J., J. Appl. Phys. 79, 5116 (1996).Google Scholar
6. Minvielle, T. J., Wilson, R. J. and White, R. L., Appl. Phys. Lett. 68, 2750 (1996).Google Scholar
7. Hildner, M. L., Minvielle, T. J. and Wilson, R. J., Surf. Sci., in press.Google Scholar
8. Minvielle, T. J., White, R. L., Hildner, M. L. and Wilson, R. J., Surf. Sci 366, L755 (1996).Google Scholar
9. Farrow, R. F. C., Marks, R. F., Rabedau, T. A., Toney, M. F., Dobbertin, D., Beyers, R., Parkin, S. S. P., J. Appl. Phys. 76, 3688 (1994).Google Scholar
10. Minvielle, T. J., White, R. L. and Wüson, R. J., J. Mag. Mag. Mat. 168, 243 (1997).Google Scholar
11. Neel, L., Comp. Rend. Acad. Sci. France 255, 1676 (1962).Google Scholar