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Effect of Substrate Materials on Mechanical Properties andMicrostructure of Carbon Nitride Films Prepared by Ion-beam-assisteddeposition

Published online by Cambridge University Press:  17 March 2011

Hidenobu Ohta
Affiliation:
Nagoya University, Department of Microsystem Engineering, Nagoya, Aichi, 4648603, Japan
Akihito Matsumuro
Affiliation:
Nagoya University, Department of Microsystem Engineering, Nagoya, Aichi, 4648603, Japan
Yutaka Takahashi
Affiliation:
Mie University, Department of Mechanical Engineering, Tsu, Mie, 5148507, Japan
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Abstract

Carbon nitride (C-N) thin films were prepared on several substrates byion-beam-assisted deposition technique. In this experiment, carbon wasevaporated by electron beam. Nitrogen and argon ion beams were bombardedsimultaneously. Aluminum alloy (7075), high-carbon chrome bearing steel(SUJ2), pure titanium plates (99.5%) and Si(100) wafer were used assubstrates. Here, mechanical properties, such as hardness, adhesion,friction coefficient and wear resistance were investigated. These resultsshow the adhesion between the films and substrates were improved byformation of the carbon layer. The microstructure of the carbon nitridefilms were investigated by cross sectional high-resolution transmissionelectron microscopy (HRTEM).

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Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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