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Direct Writing Using Laser Chemical Vapor Deposition

Published online by Cambridge University Press:  15 February 2011

S. D. Allen ,
A. B. Trigubo  and
R. Y. Jan
S. D. Allen
Affiliation:
Center for Laser Studies, University of Southern California, University Park DRB 17, Los Angeles, California 90089-1112 USA
A. B. Trigubo
Affiliation:
Center for Laser Studies, University of Southern California, University Park DRB 17, Los Angeles, California 90089-1112 USA
R. Y. Jan
Affiliation:
Center for Laser Studies, University of Southern California, University Park DRB 17, Los Angeles, California 90089-1112 USA
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Abstract

Metal, dielectric and semiconductor films have been deposited by laser chemical vapor deposition (LCVD) using both pulsed and cw laser sources on a variety of substrates. For LCVD on substrates such as quartz, the deposition was monitored optically in both transmission and reflection using a collinear visible laser and the depositing CO2 laser. Deposition initiation and rate were correlated with irradiation conditions, the laser generated surface temperature, and the changing optical properties of the filmpsubstrate during deposition. Single crystallites of W greater than 100 pm tall were deposited using a Kr laser on Si substrates.

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References

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