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Depth Dependence of Dopant Induced Features on The Si(100)2x1:H Surface and Its Application for Three Dimensional Dopant Profiling

Published online by Cambridge University Press:  17 March 2011

Lequn Liu ,
Jixin Yu  and
Joseph W. Lyding
Lequn Liu
Affiliation:
Department of Materials Science and Engineering, University of Illinois, Urbana, IL 61801
Jixin Yu
Affiliation:
Department of Electrical and Computer Engineering, University of Illinois, Urbana, IL 61801
Joseph W. Lyding
Affiliation:
Beckman Institute, University of Illinois, Urbana, IL 61801.
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Abstract

The lack of surface states within the band gap of the perfect Si(100)2x1:H surface opens the way to scanning tunneling microscopy studies of dopant atom sites in Si(100). In this paper, Boron and Arsenic induced features are studied by ultrahigh vacuum scanning tunneling microscopy. The values of their amplitudes naturally group such that several subsurface layers can be identified. This technique for producing atom-resolved three-dimensional maps of electrically active dopants in silicon may be a useful metric for characterizing dopant profiles in ultra-small electronic device structures.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 699: Symposium R – Electrically Based Microstructural Characterization III , 2001 , R4.5
Copyright
Copyright © Materials Research Society 2002

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References

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