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Deposition of Potassium Niobate Thin Films by Metalorganic Chemical Vapor Deposition and their Nonlinear Optical Properties

Published online by Cambridge University Press:  21 February 2011

M. J. Nystrom ,
B. W. Wessels ,
J. Chen ,
D. Studebaker ,
T. J. Marks ,
W. P. Lin  and
G. K. Wong
M. J. Nystrom
Affiliation:
Department of Materials Science and Engineering Northwestern University, Evanston, IL 60208
B. W. Wessels
Affiliation:
Department of Materials Science and Engineering Northwestern University, Evanston, IL 60208
J. Chen
Affiliation:
Department of Chemistry Northwestern University, Evanston, IL 60208
D. Studebaker
Affiliation:
Department of Chemistry Northwestern University, Evanston, IL 60208
T. J. Marks
Affiliation:
Department of Chemistry Northwestern University, Evanston, IL 60208
W. P. Lin
Affiliation:
Department of Physics and Astronomy Northwestern University, Evanston, IL 60208
G. K. Wong
Affiliation:
Department of Physics and Astronomy Northwestern University, Evanston, IL 60208
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Abstract

Ferroelectric potassium niobate thin films have been deposited by conventional, low pressure metalorganic chemical vapor deposition on several types of oxide substrates. The films were epitaxial with a c-axis orientation normal to the substrate. Atomic force microscopy revealed a surface roughness of 1 - 4 nm. Transmission electron microscopy showed the film/substrate interface to be semi-coherent with lattice misfit accommodated by misfit dislocations. The nonlinear optical properties of the KNbO3 films were measured by a transmission technique. The room temperature, effective second order nonlinear coefficient was 13 pm/V.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 392: Symposium U – Thin Films for Integrated Optics Applications , 1995 , 183
Copyright
Copyright © Materials Research Society 1995

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