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Characterization of Porous Silicate Low-k Films by Ellipsometric Porosimetry and Variable-energy Positron Annihilation Spectroscopy

Published online by Cambridge University Press:  01 February 2011

Kenji Ito ,
Yoshinori Kobayashi ,
Ryoichi Suzuki ,
Toshiyuki Ohdaira ,
Runsheng Yu ,
Kiminori Sato ,
Kouichi Hirata ,
Hisashi Togashi ,
Miki Egami  and
Hiroki Arao
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Kenji Ito
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Yoshinori Kobayashi
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Ryoichi Suzuki
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Toshiyuki Ohdaira
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Runsheng Yu
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Kiminori Sato
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Kouichi Hirata
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Hisashi Togashi
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305–8565, Japan
Miki Egami
Affiliation:
Fine Chemicals Multi Media Research Center, Catalysts & Chemicals Industries Co., Ltd. (CCIC), Wakamatsu–ku, Fukuoka 808–0027, Japan
Hiroki Arao
Affiliation:
Fine Chemicals Multi Media Research Center, Catalysts & Chemicals Industries Co., Ltd. (CCIC), Wakamatsu–ku, Fukuoka 808–0027, Japan
Akira Nakashima
Affiliation:
Fine Chemicals Multi Media Research Center, Catalysts & Chemicals Industries Co., Ltd. (CCIC), Wakamatsu–ku, Fukuoka 808–0027, Japan
Michio Komatsu
Affiliation:
Fine Chemicals Multi Media Research Center, Catalysts & Chemicals Industries Co., Ltd. (CCIC), Wakamatsu–ku, Fukuoka 808–0027, Japan
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Abstract

We a pplied ellipsometric porosimetry and variable-energy positron annihilation spectroscopy to the pore characterization of spin-on-glass silicon-oxide-backboned porous thin films with different relative dielectric constants between 2.3 and 3.2. It was found that the relative dielectric constant decreases linearly with increasing open porosity deduced by ellipsometric porosimetry. Comparison of the open porosity with the average pore size deduced by positron annihilation lifetime spectroscopy suggested that mesopores less contribute to open porosity and are not so effective in decreasing film relative dielectric constant in comparison with micropores.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 788: Symposium L – Continuous Nanophase and Nanostructured Materials , 2003 , L8.19
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES AND NOTES

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