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A Versatile Microwave Plasma Applicator

Published online by Cambridge University Press:  21 February 2011

Tian-Ren Ji  and
John E. Gerling
Tian-Ren Ji
Affiliation:
Guoguang Electron Tube Works, Chengdu, Peoples Republic of China
John E. Gerling
Affiliation:
Gerling Laboratories, 1628 Kansas Avenue, Modesto, CA
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Abstract

This paper describes a device used for the introduction of microwave energy into a plasma chamber over a wide area with hightransfer efficiency and good energy uniformity.

The applicator design was based on a slotted waveguide combined with a quartz window. The impedance properties were calculated forslots in the broad wall of WR430 waveguide. Low power simulating tests were conducted to determine the optimum geometry. A simpletest system was used to measure and plot the three-dimensional spatial energy distribution

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 124: Symposium M – Microwave Processing of Materials I , 1988 , 353
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

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