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UV Photon-Assisted Refractory Metal Deposition

Published online by Cambridge University Press:  28 February 2011

G. A. Kovall ,
J. C. Matthews  and
R. Solanki
G. A. Kovall
Affiliation:
Department of Applied Physics and Electrical Engineering, Oregon Graduate Center, Beaverton, OR 97006-1999
J. C. Matthews
Affiliation:
Fusion Systems Corporation, Rockville, MD 20855
R. Solanki
Affiliation:
Department of Applied Physics and Electrical Engineering, Oregon Graduate Center, Beaverton, OR 97006-1999
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Abstract

We have been investigating deposition of tungsten and molybdenum films at lover temperatures than conventional CVD processes with the aid of ultraviolet photons. The photon source is a high intensity, medium-pressure mercury lamp. W and Mo films have been deposited from their respective hexacarbonyls. W films have also been obtained by photon enhanced reduction of tungsten hexafluoride. In all cases films were deposited over 75 mm diameter substrates, which included quartz, silicon dioxide, and silicon wafers. The deposition system, conditions and the properties of the photodeposited films are presented.

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