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The Relationship Between Emission Spectroscopy and Optical Properties of Amorphous Carbon Films

Published online by Cambridge University Press:  25 February 2011

Richard M. Roth  and
Richard H. Jarman
Richard M. Roth
Affiliation:
Amoco Corporation, Corporate Research, P.O. Box 400, Naperville, IL 60566
Richard H. Jarman
Affiliation:
Amoco Corporation, Corporate Research, P.O. Box 400, Naperville, IL 60566
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Abstract

Emission from CH and H radicals was monitored during the deposition of amorphous carbon films in a capacitively coupled rf glow discharge. Both the spectral and spatial distributions of the emission were studied. The relative intensity of the CH and H emission was found to be sensitive to changes in discharge parameters. Preliminary results indicate a correlation between the ratios of the CH to H emission intensities and the optical properties of the deposited films.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 98: Symposium K – Plasma Processing and Synthesis of Materials II , 1987 , 327
Copyright
Copyright © Materials Research Society 1987

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References

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