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The control of gold nanocluster sizes in dielectric thin filmsvia ion beam assisted deposition

Published online by Cambridge University Press:  17 March 2011

S. Schiestel ,
C.A. Carosella ,
G.K. Hubler ,
S.B. Qadri ,
D. Knies  and
R.M. Stroud
S. Schiestel
Affiliation:
George Washington University, Washington, DC 20052 Naval Research Laboratory, Code 6370, Washington, DC 20375, USA
C.A. Carosella
Affiliation:
George Washington University, Washington, DC 20052 Naval Research Laboratory, Code 6370, Washington, DC 20375, USA
G.K. Hubler
Affiliation:
George Washington University, Washington, DC 20052 Naval Research Laboratory, Code 6370, Washington, DC 20375, USA
S.B. Qadri
Affiliation:
George Washington University, Washington, DC 20052 Naval Research Laboratory, Code 6370, Washington, DC 20375, USA
D. Knies
Affiliation:
George Washington University, Washington, DC 20052 Naval Research Laboratory, Code 6370, Washington, DC 20375, USA
R.M. Stroud
Affiliation:
George Washington University, Washington, DC 20052 Naval Research Laboratory, Code 6370, Washington, DC 20375, USA
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Abstract

Gold nanoclusters in silica were deposited by co-evaporation of gold andsilica in the presence of an argon ion beam. Gold clusters are formedin-situ during the deposition process. The damage induced by the ion beamcontrols the cluster size, and clusters with a diameter between 15 – 30 Åare obtained. The Au clusters show a highly compressive strain as measuredby X-ray diffraction and lattice parameters up to 3.5 % smaller than in bulkgold are observed. Post- deposition annealing in air leads to cluster growthand release of the strain. Annealing near the melting point of gold causesthe clusters to grow exponentially up to 180 Å. This is accompanied by ablue shift of the Mie absorption peak. Furthermore the formation of asuperlattice was observed by TEM and confirmed by small angle XRDmeasurements.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 647: Symposium O – Ion Beam Synthesis & Processing of Advanced Materials , 2000 , O11.22
Copyright
Copyright © Materials Research Society 2001

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