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Pre-Patterned CVD Graphene: Insights on ALD deposition parameters and their influence on Al2O3 and graphene layers

Published online by Cambridge University Press:  18 March 2016

Gabriela B. Barin ,
Antonio G. Souza Filho ,
Ledjane S. Barreto  and
Jing Kong
Gabriela B. Barin*
Affiliation:
Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology, 77 Mass Avenue, Cambridge, MA 02139, United States Programa de Pós-Graduação em Ciência e Engenharia de Materiais, Universidade Federal de Sergipe, Av.Marechal Rondon, São Cristóvão 49000-100, Brazil
Antonio G. Souza Filho
Affiliation:
Departamento de Física, Univ.Federal do Ceará, P.O.Box 6030, Fortaleza, 60440-900, Brazil
Ledjane S. Barreto
Affiliation:
Programa de Pós-Graduação em Ciência e Engenharia de Materiais, Universidade Federal de Sergipe, Av.Marechal Rondon, São Cristóvão 49000-100, Brazil
Jing Kong
Affiliation:
Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology, 77 Mass Avenue, Cambridge, MA 02139, United States
*
*(Email: gabriela.borin@gmail.com)
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Abstract

Fabrication of graphene nanostructures it is important for both investigating their intrinsic physical properties and applying them into various functional devices. In this work we present a study on atomic layer deposition (ALD) of Al2O3 to produce patterned graphene through area-selective chemical vapor deposition (CVD) growth. A systematic parametric study was conducted to determine how the number of cycles and the purging time affect the morphology and the electrical properties of both graphene and Al2O3 layers.

Keywords

atomic layer depositionchemical vapor deposition (CVD) (deposition)passivation

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Type
Articles
Information
MRS Advances , Volume 1 , Issue 20: Nanomaterials and Synthesis , 2016 , pp. 1401 - 1409
Copyright
Copyright © Materials Research Society 2016 

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References

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