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The sputtering of oxide-covered magnesium surfaces

Published online by Cambridge University Press:  24 October 2008

R. W. Ditchburn  and
K. I. Roulston
R. W. Ditchburn
Affiliation:
Trinity College
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Extract

The rate of sputtering of magnesium in oxygen was observed with an apparatus which permitted the field immediately in front of the target to be reversed. Change in the sign of the field did not affect the rate of sputtering which remained abnormally low. It is therefore concluded that, while the low rate is in some way due to the presence of an oxide film, it is not due to charged particles being returned to the cathode by the electric field, as had been suggested by other workers.

Information

Type
Research Article
Information
Mathematical Proceedings of the Cambridge Philosophical Society , Volume 34 , Issue 4 , October 1938 , pp. 620 - 624
Copyright
Copyright © Cambridge Philosophical Society 1938

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References

REFERENCES

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