Hostname: page-component-cb9f654ff-c75p9 Total loading time: 0 Render date: 2025-08-23T06:05:29.719Z Has data issue: false hasContentIssue false
  • English
  • Français

Role of static inductance on ion beam emission in plasma focus devices

Published online by Cambridge University Press:  01 May 2012

FARZIN M. AGHAMIR  and
REZA A. BEHBAHANI
FARZIN M. AGHAMIR
Affiliation:
Department of Physics, University of Tehran, N. Kargar Ave, Tehran 143399, Iran (aghamir@ut.ac.ir)
REZA A. BEHBAHANI
Affiliation:
Department of Physics, University of Tehran, N. Kargar Ave, Tehran 143399, Iran (aghamir@ut.ac.ir)
Rights & Permissions [Opens in a new window]

Abstract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

The role of static inductance on ion beam emission in plasma focus devices, based on anomalous resistivity, is reported. The effect of gas pressure variation on the process of energy transfer into plasma is investigated and discussed by using Lee's model. The dependence of ion beam production on filling gas pressure along with change in static inductance is studied. The results show that increase of static inductance in a specific range of operating pressure can enhance the efficiency of dense plasma focus device.

Information

Type
Letter
Information
Journal of Plasma Physics , Volume 78 , Issue 5 , October 2012 , pp. 585 - 588
Copyright
Copyright © Cambridge University Press 2012

References

[1]Bernstein, J. M. 1970 Phys. Fluid 13, 2858.CrossRefGoogle Scholar
[2]Gary, S. and Hohl, F. 1973 Phys. Fluid 16, 997.CrossRefGoogle Scholar
[3]Imshennik, V. S., Osovets, S. M. and Otroshchenko, T. L. V. 1973 Sov. Phys. JETP 37, 1037.Google Scholar
[4]Kondoh, Y. and Hirano, K. 1978 Phys. Fluid 21, 1617.CrossRefGoogle Scholar
[5]Zambreanu, V. and Doloc, C. M. 1992 Plasma Phys. Control. Fusion 34, 1433.CrossRefGoogle Scholar
[6]Gary, S. 1974 Phys. Fluid 17, 2135.CrossRefGoogle Scholar
[7]Kondoh, Y. 1984 J. Phys. Soc. Jpn. 53, 4200.CrossRefGoogle Scholar
[8]Deutsch, R. and Kies, E. 1988 Plasma Phys. Cotrol. Fusion 30, 263.CrossRefGoogle Scholar
[9]Zakaullah, M., Omar, A. and Murtaza, G. 1996 Plasma Sources Sci. Technol. 5, 544.CrossRefGoogle Scholar
[10]Wong, C. S. and Yap, S. L. 2005 Solid State Phenom. 107, 151.CrossRefGoogle Scholar
[11]Lee, S. 2010 Radiative Dense Plasma Focus Computation Package: RADPF. http://www.plasmafocus.net, http://www.plasmafocus.net/IPFS/modelpackage/File1RADPF.htm, http://www.plasmafocus.net/IPFS/modelpackage/File2Theory.pdf, http://www.plasmafocus.net/IPFS/modelpackage/UPF.htm. Accessed Oct. 19, 2011.Google Scholar
[12]Lee, S. and Saw, S. H. 2008 Appl. Phys. Lett. 92, 021503.CrossRefGoogle Scholar
[13]Liu, M. H., Feng, X. P., Springham, S. V. and Lee, S. 1998 IEEE Trans. Plasma. Plasma Sci. 26, 135.Google Scholar
[14]Lee, S., Lee, P., Zhang, G., Feng, X., Gribkov, V. A., Liu, M., Serban, A. and Wong, T. 1998 IEEE Trans. Plasma Sci. 26, 1119.Google Scholar
[15]Lee, S., Saw, S. H., Lee, P. C. K., Rawat, R. S. and Schmit, H. 2008 Appl. Phys. Lett. 92, 111501.CrossRefGoogle Scholar
[16]Gribkov, V. A.et al. 2007 J. Phys. D 40, 3592.CrossRefGoogle Scholar
[17]Lee, S. 2009 Appl. Phys. Lett. 95, 151503.CrossRefGoogle Scholar
[18]Davidson, R. C. and Krall, N. A. 1977 Nucl. Fusion 17, 6.CrossRefGoogle Scholar
[19]Bernard, A.et al. 1998 Moscow J. Phys. Soc. 8, 93.Google Scholar
[20]Lee, S., Saw, S. H., Abdou, A. E. and Torreblanca, H. 2011 Characterizing plasma focus devices-role of the static inductance-instability phase fitted by anomalous resistances. J. Fusion. Energ. 30, 4.CrossRefGoogle Scholar